Using low energy ion beam sputtering at normal incidence and stainless steel as seeding material for varied sputtering periods at room temperature, fabrication of nano-patterned Si surfaces with simultaneous metal co-deposition is demonstrated. The nano-patterned surfaces created with an ion beam at such a low energy range are being investigated as prospective candidates in a variety of nano-technological domains. From morphological study, the evolution of nano-dot topography on the Si surface has been observed. Using X-rays to investigate chemical statesThe presence of metal impurities such as Fe and Cr emanating from the stainless steel target is shown by photoelectron spectroscopy (XPS). The identified elements' high-resolution XPS core level spectra are analysed, and subsequent analysis of their compositional details suggests that metal-oxide and metal-silicide development on the sample surface.
Author (S) Details
AninditaDeka
Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata-700064, India.
Pintu Barman
Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata-700064, India.
Prof.Satyaranjan Bhattacharyya
Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata-700064, India.
View Book :-https://stm.bookpi.org/NUPSR-V12/article/view/2637
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