Thursday, 27 April 2023

Plasmas Afterglows with N2 for Surface Treatments- Edition 3 | Book Publisher International

 The part 3 of the book always concerns N2 plasmas and afterglows at reduced and atmospheric smoke pressures, adding new results on result of all the N2(B,v’) and N2(X,v)  states in (Ar)-N2 plasma and afterglows at depressed and high vapor pressures. Production of N and C-atoms in Ar-N2-CH4 gas combinations was established following in position or time high capacity RF plasma light at atmospheric vapor pressure as shown in the under figure and was frequented in microwave afterglows at reduced gas pressures place a special consideration is brought to responses in early (pink) afterglow environments. Also, more results than in the previous division 3 were given in the Plasmalyse catalyst for medical tools sterilization. N2 discharges and afterglows forming showing the pairing of electron and N2 (X, v) distributions are remembered with Mario Capitelli. Finally, an request of N-atoms source in N2 HF brightness is reported on the CN thin film dethroning. From recent results got in Laplace Lab. concerning  the Laser radiance measurements (TALIF) of N and H atoms mass in N2-H2 afterglows (PHD thesis of V. Ferrer, Toulouse 2023), it is understood that the rate cooperative of the N+H+N2 →  NH+ N2 reaction, preferred in Chapter 4 and 13 of the present book, must be manifolded by 50, that confirms the pretended value of 10-33 cm6s-1 of Gordiets and others. (B.Gordiets, CM Ferreira, MJ Pinheiro and A.Ricard, Plasma Source Sc. Tech. (1998) 7, 363). Other corrections of premature results are brought in chapters 21 and 26…..

Author(s) Details:

André Ricard,
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne, 31062 Toulouse Cedex 9, France.

Please see the link here: https://stm.bookpi.org/PAWNST-E3/article/view/10321

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