The goal of this work is to demonstrate how a hollow cathode magnetron can be used to characterise an ionised physical vapour deposition (IPVD). To study a process for the creation of excited argon and copper atoms and ions, researchers used the Langmuir probe, optical emission spectroscopy, and grid quartz crystal microbalance. The primary processes were determined using measurement results, and the kinetic mechanisms of excitation were considered. The pressure range was 0.5 to 10 mTorr, with a discharge power of 1 to 5 kW. In the growth chamber, plasma parameters such as electron densities and temperatures, electron energy distribution functions, plasma space, and floating potentials were calculated as a function of location, pressure, and power. For 10 mTorr, the plasma density can reach 1012 cm-3 at a distance of 20 cm from the magnetron. The ionised copper flux fraction was determined as a function of gas pressure, discharge power, and distance from the target using a grid quartz crystal microbalance. The degree of ionisation at a distance of 31 cm approaches 50% at gas pressures greater than 15 mTorr.
Author(S) Details
I. I. Usatov
Bauman Moscow State Technical University, Mytishchi Branch, 141005, Mytischi-5, Moscow Region, Russia.
N. P. Poluektov
Bauman Moscow State Technical University, Mytishchi Branch, 141005, Mytischi-5, Moscow Region, Russia.
Yu P. Tsar’gorodsev
Bauman Moscow State Technical University, Mytishchi Branch, 141005, Mytischi-5, Moscow Region, Russia.
A. G. Evstigneev
Bauman Moscow State Technical University, Mytishchi Branch, 141005, Mytischi-5, Moscow Region, Russia.
I. A. Kamyschov
Bauman Moscow State Technical University, Mytishchi Branch, 141005, Mytischi-5, Moscow Region, Russia.
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