Reactive vapor plasma improved chemical fumes deposition (PECVD) was secondhand for the facile surface dethroning of hydrogenated diamond-like element (HDLC) on a Si (100) substrate. The surface of the deposited coating is free of pinholes, alike, and adheres well to the substrate. The combined surface HDLC was annealed in a vacuum at hotnesses from 200 to 1000°C. Instrumental techniques FTIR, AFM, STM, and EC-AFM were favorably used to characterize the semantic changes in the HDLC films due to the annealing effect. Raman study was also performed in addition to STM and EC-AFM to determine the working and conductive nature of the annealed surface of HDLC.
Author(s) Details:
Hari Shankar Biswas,
Department
of Chemistry, Surendranath College, 24/2, Mahatma Gandhi Road, Kolkata-700009,
India.
Please see the link here: https://stm.bookpi.org/NACB-V5/article/view/11577
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