This study investigates the densities of active species, including N and O atoms, N₂(A), N₂(X, v > 13) metastable molecules, and N₂⁺ ions, in the afterglows of N₂ H₂, Ar-N₂-H₂, and Ar-N₂-O₂ microwave discharges. Optical emission spectroscopy and NO titration methods were used for precise calibration. The results reveal significant variations in active species densities across different gas mixtures, providing insights into optimizing plasma conditions. The N‐atom density is in the range of 1015cm−3 in N2 − H2, Ar − N2 and Ar − N2 − H2. It is lower by a factor of 4 in Ar − N2 − O2 gas mixtures. The O‐atom density coming from O2 impurity in the N2 −xH2 discharges decrease with x from 7 1013cm−3 for x = 0 to 3 1013cm−3 for x=2.5%. A strong O2 dissociation was found in the Ar‐x(N2‐5%O2) gas mixtures, decreasing from a full dissociation [O] = 2[O2] at x=50%. These findings have practical implications for applications such as sterilization and surface treatments.
Author
(s) Details
Hayat
Zerrouki
Université de Toulouse; CNRS, LAPLACE 118 Route de Narbonne,
F-31062 Toulouse Cedex 9, France.
André
Ricard
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de
Narbonne, 31062 Toulouse Cedex 9, France.
Jean-Philippe
Sarrette
Université de Toulouse; CNRS, LAPLACE 118 Route de Narbonne,
F-31062 Toulouse Cedex 9, France.
Please see the book here:- https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH14
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