Effect of O2 into N2 Afterglows in RF and Corona Discharges | Chapter 17 | Plasmas Afterglows with N2 for Surface Treatments synthesis 2024

The afterglows in N² −O₂ gas mixtures have been previously described: N− atoms titration by NO [A − 1], oxygen in impurity in N₂ at reduced gas pressure and at atmospheric gas pressure. The N and O-atoms density versus the O₂ percent from 1 to 4% into N₂ in HF flowing afterglow (at 7 Torr, 0.5 slpm, 150 W) was strongly decreasing for N-atoms from 15 to 210¹⁴ cm⁻³ and kept a nearly constant value for O-atoms density: 7-9 10¹⁴ cm⁻³, a value which is higher than the N-atom density in the range 2 − 10%O₂ into N₂. In RF afterglows, it was studied the effect of O-atoms and O₂ molecules when O₂ was introduced into N₂ before or after the plasma (8 Torr, 1 slpm, 100 W ). It is concluded that a quenching of N₂ active species by O-atoms more effective than with O₂ in the early and late afterglows. At N₂ the atmospheric gas pressure of Corona Plasmas with O2 impurity, it has been measured the density of the N₂O¹ S excimer equal to about 10¹² cm⁻³, largely less than the N and N₂ (A) densities: (5-7) 10¹⁴ cm⁻³.

 

Author (s) Details

André Ricard
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne, 31062 Toulouse Cedex 9, France.

 

Anne-Marie Pointu
LPGP, Université de Paris-Saclay, 91405 Orsay, France.

 

Soo-Ghee Oh
Department Energy System Res., Ajou University, Suwon 16499, Korea.

 

Please see the book here:- https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH17