Examining Microwave Afterglows in N2 Gas Mixtures Using Spectroscopy and LIF: Application to Surface Cleaning | Chapter 13 | Plasmas Afterglows with N2 for Surface Treatments synthesis 2024

Variations of N, H, O and C-atoms density have been determined along the reduced pressure flowing afterglows of microwave Ar-N₂-H₂ discharges that have been experimented with in Plasmas Labs of Nancy, Montreal, Orsay and Toulouse. In the present chapter, previous experiments in N₂‐O₂, N₂ − H₂ and N₂ − CH₄ fulfilled by the LSGS(Nancy), Plasmas Lab (Montreal), LPGP (Orsay), Laplace (Toulouse) and SNPE (Bordeaux) are reported. The active species density is obtained by NO titration for N and O-atoms and by line intensity ratios for the H and C-atoms. A small maximum of N‐atom density in the range (0.5‐3) 10¹⁵cm⁻³ was observed when a few H₂ or CH₄ was added to N₂ and the C/N ratio was about 10⁻³ in the afterglow of studied microwave setups.

The results obtained by LIF measurements in Orsay and Toulouse Labs are reported for N and H –atoms. By comparing the TALIF and the results of H-atoms density obtained from OES in N₂-1%H₂ afterglows, it has been chosen the appropriate rate coefficient of the N+H+N₂ reaction.

The surface cleaning by N and O-atoms has been experimented.

 

Author (s) Details

André Ricard
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne, 31062 Toulouse Cedex 9, France.

 

G. Baravian
LPGP, Universite´ de Paris-Sud, CNRS, 91405 -Orsay, France.

 

J. Amorim
Departamento de Fisica, Instituto Tecnologico de Aeronautica, Centro Tecnico Aeroespacial, 12228900 Sao Jose dos Campos, Brazil.

 

F. Gaboriau
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne, 31062 Toulouse Cedex 9, France.

 

M. Gaillard
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne, 31062 Toulouse Cedex 9, France.

 

Please see the book here:- https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH13