With the advent of new materials, the microchip industry is
investigating new architecture to further scale down the device size. New
technologies are on the way to achieving this goal without compromising the
device’s performance and benefits. In this new scenario, corona charge
deposition technique (CCDT) has become an indispensable part of the thin film
industry. Due to the non-invasive and non-destructive nature of corona charge
ions, they are effectively being used to improve the device properties. This
technique is in use for device characterization and testing. Whole wafer mapping of the SiO2 film on
silicon can be carried out employing this technique. Failure analysis of
junction field effect transistor (JFET) has clearly established that a device
is good by design, not because it is free from surface ions. CCDT is also useful
to understand the electrical properties of insulators and other materials.
Isotope tracer structures were used to study the corona induced relaxation
mechanism in SiO2. Apparently, the stress relaxation mechanism was found to be
the deciding factor in oxidant transport through the film. Corona-Kelvin
non-contact metrology or the C-KM is a recent development in this field for the
characterization of silicon, new materials and dielectrics. It is the newest
technology for device cooling. Corona based “ionic wind” is the next generation
cooling fan for electronic devices. Different aspects of design and technology
are under investigation. Corona Discharge based electrostatic spray coating
technology is under investigation for advanced electrode processing of Li-ion
batteries. In this paper, the status of
all these fields of applications of corona charge deposition technique in the
semiconductor industry has been reviewed. Further, the methodology involved is
described. The advances as well as challenges and improvements including future
research are also discussed.
Author(s) Details:
Ila Prasad,
Department of Physics and Engineering, Faculty of Physics,
University of St Thomas, Houston, TX, USA.
Please see the link here: https://stm.bookpi.org/CAERT-V1/article/view/14161
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