The iron nitriding which allows a hard coating process has been studied in microwave plasma afterglows in Ar-N2, Ar- N2-H2 and Ar-N2-CH4 gas mixtures by optical spectroscopy. The thickness of ϵ and γ’ layers have been measured by micrography. It is shown that the introduction of H2 and CH4 into N2 removed the native oxide layers and allowed the growth of ϵ - layers.
To avoid film damage by the plasma high-energy electrons, remote
microwave plasmas have given satisfactory results. An iron nitriding with ϵ -
layers thickness of 10 μm has been obtained in an industrial scale reactor of
90 liters with Ar-N2-H2 gas mixtures heated at 600°C for
2 hours.
Author
(s) Details
Thierry Czerwiec
Department of Physics and Chemistry of Solids and Surfaces, Institut Jean
Lamour, Nancy- Universite, CNRS, Parc de Saurupt, CS 14234, 54042 Nancy Cedex,
France.
Thierry Belmonte
Department of Physics and Chemistry of Solids and Surfaces, Institut Jean
Lamour, Nancy- Universite, CNRS, Parc de Saurupt, CS 14234, 54042 Nancy Cedex,
France.
André Ricard
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne,
31062 Toulouse Cedex 9, France.
Please see the book here:- https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH22
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