Thursday, 10 April 2025

N, H and C-atoms Concentrations in Flowing Afterglows of Microwave R/N2-H2 and R/N2-CH4 Discharges with R=N2, He, Ar and Their Applications to TiO2 Surface Nitriding | Chapter 24 | Plasmas Afterglows with N2 for Surface Treatments synthesis 2024

Flowing afterglow plasmas have found their interest in soft surface treatments of sensitive materials in life science as the sterilization of medical instruments. Variations of N,H and C-atoms density has been determined along the reduced pressure flowing afterglows of microwave R/N2-H2 and R/N2-CH4 discharges with R=N2, He and Ar. Density of H and C-atoms and other nitrogen-active species such as N2(A), N2(X,v>13),N2+,NH,N(2D), CN were obtained from that of N-atoms calibrated by NO titration, using the method of band intensity ratios in several conditions (between early and late afterglows). It has been obtained the density of O-atoms and NO molecules coming from air impurities. It has been deduced the wall destruction probability of H,O and C-atoms on the quartz afterglow tube: \(\gamma\)HR,N2=10-3,\(\gamma\)oR,N2=(0.4-1) 10-3 and \(\gamma_C^{N2}\)=(0.7)10-3. The effects of H and C-atoms on N-atoms inclusion inside TiO2 surfaces are reported.

 

Author (s) Details

 

André Ricard
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne, 31062 Toulouse Cedex 9, France.

 

Jayr Amorim
Department Fisica, Inst. Tec. Aeronautica 12228-900, Sao Jose dos Campos, Brazil.

 

Moustapha Abdeladim
LMSE, Faculté de Génie Electrique, U.S.T.O, BP 1505, El Mnaour-Oran, Algeria.

 

Jean-Philippe Sarrette
LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 route de Narbonne, 31062 Toulouse Cedex 9, France.

 

Yu-Kwon Kim
Department of Energy Systems Research, Ajou University, Suwon 16499, Korea and Department of Chemistry, Ajou University, Suwon 16499, Korea.+

 

Please see the book here:- https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH24

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