The present book is especially focused on flowing plasmas
and afterglow devices containing N2. The plasmas were produced by
high-frequency (RF, microwaves) discharges at low gas pressures. The microwave
plasmas with surfatron and surfaguide cavities are specifically studied.
The most relevant active species in the studied flowing
plasmas are the atoms and radicals coming from dissociated molecules ( N2, H2,
O2, CH4). There is an interest in rare gas–molecule mixtures to obtain plasmas
with high-energy electrons in He and long plasmas residence times in Ar.
The N and O atom densities are obtained after NO titration
and related to N2 emission spectroscopy by discussing two methods to determine
the part of N+N recombination at the origin of the observed N2 radiative
states. The other active species densities are obtained by the line ratio
intensity method.
To obtain quantitative measurements of the active species
densities, it has been compared the results of NO titration for N and O – atoms
to laser induced fluorescence (LIF, TALIF) for N, O and H-atoms. These last
sophisticated laser method has allowed to choose the appropriate kinetic
reactions in the N2-H2 and N2-CH4 flowing afterglows.
The N, H, O and C-atoms, NH and CN radicals were studied for
plasma chemistry and surface treatments. The nitriding of TiO2 thin films has
been analysed in detail.
Author(s) Details
André RICARD
Laboratoire de Physique des Gaz et des Plasmas, Université Paris-Saclay,
CNRS, 91.400 Orsay, France and Laplace, CNRS, Université Toulouse, 31077
Toulouse, France.
Please see the book here :- https://doi.org/10.9734/bpi/mono/978-81-999106-4-5
