Last few decades, with the increase of modern technology, hydrogen
plasma has been extensively consumed in the semiconductor industries, thin film
and coating industries for silicon and diamond deposition. In the current
paper, hydrogen plasma characteristics were studied using optical emission
spectroscopy (OES) by varying microwave power and pressure separately and
simultaneously inside a quartz bell jar in a 915 MHz microwave plasma enhanced
chemical vapor deposition (MPCVD) system for diamond deposition. H\(\alpha\),
H\(\beta\) lines and Fulcher \(\alpha\) H2 band were detected at the
wavelengths of 655.95 nm, 485.7 nm and 560 nm to 640 nm, respectively. The line
intensities of H\(\alpha\) and H\(\beta\) were decreased with increasing
pressure at constant microwave (MW) power and these line intensities were
increased with increasing MW power at a fixed pressure. The ion density
initially increased and then decreased with increasing pressure further. When
MW power and pressure were increased simultaneously, the intensities of
H\(\alpha\) and H\(\beta\) lines were initially decreased and after a
critical value of MW power and pressure H\(\alpha\) and H\(\beta\)
intensities were increased. Atomic silicon emission lines were detected by
using at 70 Torr pressure and 5000 W microwave power indicating that CH4 needed
to be added before the silicon etching for the diamond deposition recipe.
Author(s)
Details
Nandadulal
Dandapat
Bio-Ceramics and Coating Division,
CSIR-Central Glass and Ceramic Research Institute (CSIR-CGCRI), 196, Raja S.C.
Mullick Road, Kolkata-700 032, India.
Karthiga Parthiban
Bio-Ceramics and Coating Division,
CSIR-Central Glass and Ceramic Research Institute (CSIR-CGCRI), 196, Raja S.C.
Mullick Road, Kolkata-700 032, India and Academy of Scientific and Innovative
Research (AcSIR), Ghaziabad 201002, India.
Sumana Ghosh
Bio-Ceramics and Coating Division,
CSIR-Central Glass and Ceramic Research Institute (CSIR-CGCRI), 196, Raja S.C.
Mullick Road, Kolkata-700 032, India.
Please see the book
here:- https://doi.org/10.9734/bpi/cmsdi/v5/551
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